Toshikazu Umatate
7Patents
6h-index
8Co-inventors
56Inventor score
Filing activity: Oct 3, 1986 → Sep 7, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4780617A | Method for successive alignment of chip patterns on a substrate | Physics | 401 | Expired |
| US5243377A | Lithography information control system | Physics | 80 | Expired |
| US6040096A | Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus | Physics | 61 | Expired |
| US4833621A | Method of and apparatus for aligning a substrate | Physics | 58 | Expired |
| US5894056A | Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus | Physics | 49 | Expired |
| US4958082A | Position measuring apparatus | Physics | 19 | Expired |
| US8795953B2 | Pattern forming method and method for producing device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.