Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus
US6040096A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 1998 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | Dec 31, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7011
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.