Wayne Clark
3Patents
2h-index
7Co-inventors
37Inventor score
Filing activity: Nov 16, 1990 → Jul 2, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6287951A | Process for forming a combination hardmask and antireflective layer | Electricity | 99 | Expired |
| US5117273A | Contact for integrated circuits | Electricity | 44 | Expired |
| US8091063B2 | Method and apparatus for characterizing an integrated circuit manufacturing process | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.