Wei-Ren Wang
8Patents
2h-index
10Co-inventors
40Inventor score
Filing activity: Jun 15, 2018 → Apr 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10978301B2 | Morphology of resist mask prior to etching | Electricity | 5 | Active |
| US10867839B2 | Patterning methods for semiconductor devices | Electricity | 2 | Active |
| US11676852B2 | Patterning methods for semiconductor devices | Electricity | 0 | Active |
| US12237224B2 | Semiconductor device and method | Electricity | 0 | Active |
| US11901228B2 | Self-aligned scheme for semiconductor device and method of forming the same | Electricity | 0 | Active |
| US12230567B2 | Semiconductor structure and manufacturing method thereof | Electricity | 0 | Active |
| US12074058B2 | Patterning methods for semiconductor devices | Electricity | 0 | Active |
| US12347726B2 | Interconnect structures and methods of forming the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.