Yan Du
5Patents
2h-index
9Co-inventors
40Inventor score
Filing activity: Oct 23, 2002 → Dec 19, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6933243B2 | High selectivity and residue free process for metal on thin dielectric gate etch application | Electricity | 6 | Expired |
| US7504338B2 | Method of pattern etching a silicon-containing hard mask | Electricity | 6 | Active |
| US7964512B2 | Method for etching high dielectric constant materials | Electricity | 2 | Expired |
| US7780862B2 | Device and method for etching flash memory gate stacks comprising high-k dielectric | Electricity | 1 | Active |
| US11877260B2 | Method for management node to page terminal device, and management node for use in wireless communication network | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.