Inventor · Livermore, CA, US

Ying Wu

46Patents
6h-index
28Co-inventors
65Inventor score

Filing activity: May 31, 2006 → Jan 23, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9583357B1 Systems and methods for reverse pulsing Electricity 90 Active
US9761459B2 Systems and methods for reverse pulsing Electricity 85 Active
US8306184B2 X-ray pixel beam array systems and methods for electronically shaping radiation fields and modulation radiation field intensity patterns for radiotherapy Human Necessities 69 Active
US9991128B2 Atomic layer etching in continuous plasma Electricity 21 Active
US9966236B2 Powered grid for plasma chamber Electricity 6 Active
US10224183B1 Multi-level parameter and frequency pulsing with a low angular spread Electricity 6 Active
US10573494B2 Multi-level parameter and frequency pulsing with a low angular spread Electricity 4 Active
US9293353B2 Faraday shield having plasma density decoupling structure between TCP coil zones Electricity 4 Active
US10304660B1 Multi-level pulsing of DC and RF signals Electricity 3 Active
US9824896B2 Methods and systems for advanced ion control for etching processes Emerging Cross-Sectional Technologies 3 Active
US10679825B2 Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate Electricity 2 Active
US10395894B2 Systems and methods for achieving peak ion energy enhancement with a low angular spread Electricity 2 Active
US9767991B2 Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication Electricity 2 Active
US10672590B2 Frequency tuning for a matchless plasma source Electricity 2 Active
US10580618B2 Multi-level pulsing of DC and RF signals Electricity 2 Active
US11342159B2 RF pulsing within pulsing for semiconductor RF plasma processing Electricity 1 Active
US10943789B2 Methods and systems for advanced ion control for etching processes Emerging Cross-Sectional Technologies 1 Active
US11011351B2 Monoenergetic ion generation for controlled etch Electricity 1 Active
US11462390B2 Multi-level parameter and frequency pulsing with a low angular spread Electricity 1 Active
US10340915B2 Frequency and match tuning in one state and frequency tuning in the other state Electricity 1 Active
US10879044B2 Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing Electricity 1 Active
US10009028B2 Frequency and match tuning in one state and frequency tuning in the other state Electricity 1 Active
US11728136B2 RF pulsing within pulsing for semiconductor RF plasma processing Electricity 1 Active
US10242845B2 Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber Electricity 0 Active
US9805963B2 Electrostatic chuck with thermal choke Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.