Inventor · Yokohama, JP

Yoneta Tanaka

14Patents
7h-index
4Co-inventors
59Inventor score

Filing activity: Jul 8, 1994 → Mar 27, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US5940528A Process for positioning of a mask relative to another mask, or masks relative to a workpiece and device for executing the process Physics 46 Expired
US5934780A Polarized light irradiation device for purposes of optical alignment of an alignment layer of a liquid crystal cell element Physics 27 Expired
US5881165A Process for the positioning of a mask relative to a workpiece and device for executing the process Physics 16 Expired
US5543890A Process and device for adjusting the distance between a workpiece and a mask Electricity 13 Expired
US5874190A Process for projection exposure of a workpiece with back alignment marks Electricity 12 Expired
US6525804B1 Exposure device capable of aligning while moving mask Physics 10 Expired
US5777747A Process for positioning a mask relative to a workpiece and device for performing the process Physics 8 Expired
US6232023A Contact exposure process and device Physics 7 Expired
US6072915A Process for pattern searching and a device for positioning of a mask to a workpiece Physics 7 Expired
US6046793A Proximity printing device with variable irradiation angle Physics 2 Expired
US12226986B2 Core material and structure Performing Operations; Transporting 0 Active
US11701868B2 Carbon fiber reinforced plastic structure and processing apparatus Chemistry; Metallurgy 0 Active
US12319034B2 Carbon fiber reinforced plastic structure and processing apparatus Chemistry; Metallurgy 0 Active
US6998738B2 Plain surface stage apparatus Physics 0 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.