Yves Rody
3Patents
1h-index
8Co-inventors
30Inventor score
Filing activity: Oct 18, 2005 → Aug 14, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8370773B2 | Method and apparatus for designing an integrated circuit using inverse lithography technology | Physics | 3 | Active |
| US7615318B2 | Printing of design features using alternating PSM technology with double mask exposure strategy | Physics | 0 | Active |
| US8715910B2 | Method for exposing an area on a substrate to a beam and photolithographic system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.