Patent · US Active

Method for exposing an area on a substrate to a beam and photolithographic system

US8715910B2 · kind B2 · utility

0Cited by

0References

19Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Vlad Temchenko · Dresden, DE
Chinteong Lim · Dresden, DE
Jens Schneider · Bielefeld, DE
Yves Rody · La Terrasse, FR

Key dates

Filing date	Aug 14, 2008
Grant date	May 6, 2014
Priority date	—
Expiry date	Oct 26, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70725
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Embodiments of the invention describe a method for exposing an area on a substrate to a beam. The method includes adjusting a focus offset of the beam with respect to the area on the substrate, tilting the beam or tilting the substrate, and exposing the area on the substrate with the beam, thereby generating locations within the area exposed with different foci. Furthermore embodiments describe computer programs for controlling a photolithographic system to do the same and a photolithographic system for doing the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.