Printing of design features using alternating PSM technology with double mask exposure strategy
US7615318B2 · kind B2 · utility
0Cited by
4References
12Claims
0Family size
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Key dates
| Filing date | Oct 18, 2005 |
| Grant date | Nov 10, 2009 |
| Priority date | — |
| Expiry date | Dec 20, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
For cases where one edge of a design feature is to be printed through a shifter mask and another one is to be printed through a binary trim mask, and where no upsizing can be performed due to the local density of the design, it is proposed to add shifters with respect to the shifter mask in such a way that all the edges are printed by the phase shift mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.