Methods and apparatus for vibration damping stage
US10031427B2 · kind B2 · utility
1Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2015 |
| Grant date | Jul 24, 2018 |
| Priority date | — |
| Expiry date | Sep 30, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.