Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography

US10048592B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Stephan Andre · Le Mousseau, FR
• Daniel Golde · Oberkochen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Johannes Ruoff · Aalen, DE
• Norbert Wabra · Werneck, DE
• Ricarda Schoemer · Zusmarshausen, DE
• Sonja Schneider · Lehrberg, DE

Key dates

• Filing date: Feb 24, 2017
• Grant date: Aug 14, 2018
• Expiry date: Feb 24, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70258
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.