Chamber with vertical support stem for symmetric conductance and RF delivery
US10049862B2 · kind B2 · utility
3Cited by
10References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2016 |
| Grant date | Aug 14, 2018 |
| Priority date | — |
| Expiry date | Jul 2, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32724
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.