Method and system for moving a substrate
US10049904B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 3, 2017 |
| Grant date | Aug 14, 2018 |
| Priority date | — |
| Expiry date | Aug 3, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and a system for moving a substrate, the system includes a chamber, a chuck, a movement system that is positioned outside the chamber, a controller, an intermediate element, at least one sealing element that is configured to form a dynamic seal between the intermediate element and the chamber housing. The movement system is configured to repeat, for each region of the substrate out of a plurality of regions of the substrate, the steps of: rotating the chuck to position a given portion of the region of the substrate within a field of view that is related to an opening of the chamber housing; and moving the chuck relation to the opening to position additional portions of the region of the substrate within the field of view that is related to the opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.