Optical method and system for critical dimensions and thickness characterization
US10054423B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2013 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Dec 26, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/365
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.