Apparatus and method for fabricating a light guiding grid
US10056426B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 8, 2013 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Jul 8, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B3/0056
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light guide grid can include a grid structure having a plurality of intersecting grid lines, each grid line having a width w, and a plurality of openings for photosensor elements between intersecting grid lines. The grid structure has a diagonal grid width between two adjacent ones of the plurality of openings in a diagonal direction. The diagonal grid width has a value exceeding approximately √3 w. An image sensor can include a light guide grid having a grid structure as described above and further include a micro-lens such as a sinking micro-lens and a color filter. A method of fabricating a light guide grid can include forming a grid above at least one photo sensor, the grid having intersecting grid lines of width w and a diagonal grid width in a diagonal direction having a value exceeding approximately √3 w.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.