Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers

US10059820B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Markus Brink · White Plains, US
• Joy Cheng · San Jose, US
• Alexander Friz · San Jose, US
• Michael A. Guillorn · Locke, US
• Chi-Chun Liu · Altamont, US
• Daniel P. Sanders · San Jose, US
• Gurpreet Singh · Alwar, IN
• Melia Tjio · San Jose, US
• HsinYu Tsai · White Plains, US

Key dates

• Filing date: Jul 25, 2017
• Grant date: Aug 28, 2018
• Expiry date: Jul 25, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/08
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self-assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern. The lamellar domain patterns are useful in forming transfer patterns comprising two-dimensional customized features.