Markus Brink
78Patents
8h-index
57Co-inventors
77Inventor score
Filing activity: Oct 26, 2011 → Apr 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10256392B1 | Vertical transmon qubit device | Electricity | 26 | Active |
| US10305015B1 | Low loss architecture for superconducting qubit circuits | Electricity | 22 | Active |
| US9437443B2 | Low-temperature sidewall image transfer process using ALD metals, metal oxides and metal nitrides | Electricity | 21 | Active |
| US10263170B1 | Bumped resonator structure | Electricity | 15 | Active |
| US10243132B1 | Vertical josephson junction superconducting device | Electricity | 15 | Active |
| US10672971B2 | Vertical transmon qubit device with microstrip waveguides | Electricity | 9 | Active |
| US9646883B2 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | Electricity | 9 | Active |
| US10355193B2 | Flip chip integration on qubit chips | Electricity | 8 | Active |
| US9466534B1 | Cointegration of directed self assembly and sidewall image transfer patterning for sublithographic patterning with improved design flexibility | Electricity | 8 | Active |
| US10505096B1 | Three-dimensional integration for qubits on multiple height crystalline dielectric | Electricity | 6 | Active |
| US10593858B2 | Low loss architecture for superconducting qubit circuits | Electricity | 6 | Active |
| US10497746B1 | Three-dimensional integration for qubits on crystalline dielectric | Electricity | 5 | Active |
| US9171796B1 | Sidewall image transfer for heavy metal patterning in integrated circuits | Electricity | 5 | Active |
| US10396268B2 | Qubit network non-volatile identification | Electricity | 4 | Active |
| US8916054B2 | High fidelity patterning employing a fluorohydrocarbon-containing polymer | Emerging Cross-Sectional Technologies | 4 | Active |
| US10431866B2 | Microfabricated air bridges for planar microwave resonator circuits | Emerging Cross-Sectional Technologies | 4 | Active |
| US9738765B2 | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers | Chemistry; Metallurgy | 4 | Active |
| US9190316B2 | Low energy etch process for nitrogen-containing dielectric layer | Electricity | 4 | Active |
| US11317519B2 | Fabrication of superconducting devices that control direct currents and microwave signals | Electricity | 3 | Active |
| US10367134B2 | Shadow mask sidewall tunnel junction for quantum computing | Electricity | 3 | Active |
| US10651361B2 | Bumped resonator structure | Electricity | 3 | Active |
| US9053982B2 | Local tailoring of fingers in multi-finger fin field effect transistors | Electricity | 3 | Active |
| US9633948B2 | Low energy etch process for nitrogen-containing dielectric layer | Electricity | 3 | Active |
| US9728421B2 | High aspect ratio patterning of hard mask materials by organic soft masks | Electricity | 2 | Active |
| US10599805B2 | Superconducting quantum circuits layout design verification | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.