Inventor · White Plains, NY, US

HsinYu Tsai

56Patents
7h-index
60Co-inventors
71Inventor score

Filing activity: Dec 2, 2011 → Dec 2, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US9576817B1 Pattern decomposition for directed self assembly patterns templated by sidewall image transfer Physics 26 Active
US8656322B1 Fin design level mask decomposition for directed self assembly Electricity 21 Active
US9306164B1 Electrode pair fabrication using directed self assembly of diblock copolymers Electricity 20 Active
US8771929B2 Tone inversion of self-assembled self-aligned structures Performing Operations; Transporting 12 Active
US9102540B2 Graphene nanomesh based charge sensor Physics 10 Active
US9646883B2 Chemoepitaxy etch trim using a self aligned hard mask for metal line to via Electricity 9 Active
US9337033B1 Dielectric tone inversion materials Physics 8 Active
US9281212B1 Dielectric tone inversion materials Physics 5 Active
US9852260B2 Method and recording medium of reducing chemoepitaxy directed self-assembled defects Emerging Cross-Sectional Technologies 4 Active
US9738765B2 Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers Chemistry; Metallurgy 4 Active
US9053982B2 Local tailoring of fingers in multi-finger fin field effect transistors Electricity 3 Active
US9057960B2 Resist performance for the negative tone develop organic development process Physics 3 Active
US8921030B2 Tone inversion of self-assembled self-aligned structures Performing Operations; Transporting 3 Active
US10059820B2 Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers Chemistry; Metallurgy 2 Active
US10114921B2 Method and recording medium of reducing chemoepitaxy directed self-assembled defects Emerging Cross-Sectional Technologies 2 Active
US9766229B2 Graphene nanomesh based charge sensor Physics 1 Active
US9911603B2 Pattern decomposition for directed self assembly patterns templated by sidewall image transfer Physics 1 Active
US9349640B1 Electrode pair fabrication using directed self assembly of diblock copolymers Electricity 1 Active
US9941121B1 Selective dry etch for directed self assembly of block copolymers Electricity 1 Active
US10600656B2 Directed self-assembly for copper patterning Electricity 1 Active
US11461640B2 Mitigation of conductance drift in neural network resistive processing units Physics 1 Active
US9558310B2 Method and system for template pattern optimization for DSA patterning using graphoepitaxy Emerging Cross-Sectional Technologies 1 Active
US9659824B2 Graphoepitaxy directed self-assembly process for semiconductor fin formation Electricity 1 Active
US10606980B2 Method and recording medium of reducing chemoepitaxy directed self-assembled defects Emerging Cross-Sectional Technologies 1 Active
US10211054B1 Tone inversion integration for phase change memory Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.