Near-field sensor height control
US10060736B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2016 |
| Grant date | Aug 28, 2018 |
| Priority date | — |
| Expiry date | Feb 1, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for determining a distance between a near field sensor and a substrate, the method may include creating a diffraction pattern by illuminating, with a beam of coherent radiation having a wavelength that does not exceed twenty nanometers, a slit that is formed between the substrate and an opaque element; detecting, by a detector, multiple portions of the diffraction pattern and generating detection signals indicative of the multiple portions of the diffraction pattern; processing the detection signals to determine a height of the slit; and determining the distance between the near field sensor and the substrate based upon (a) the height of the slit, and (b) a relationship between the height of the slit and a location of the near field sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.