Configuration independent gas delivery system
US10128087B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2015 |
| Grant date | Nov 13, 2018 |
| Priority date | — |
| Expiry date | Aug 1, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A gas delivery apparatus for supplying process gas to a processing chamber of a plasma processing apparatus includes a mixing manifold having a plurality of gas inlets on a surface thereof, the gas inlets being equally spaced from a center mixing point of the mixing manifold; and optionally a plurality of gas supplies in communication with the plurality of gas inlets on the surface of the mixing manifold. A method of supplying gas to a processing chamber of a plasma processing apparatus using such a gas delivery apparatus involves providing a plurality of gas supplies in communication with a plurality of gas inlets on a surface of a mixing manifold; flowing at least two different gases from the plurality of gas supplies to the mixing manifold to create a first mixed gas; and supplying the first mixed gas to a plasma processing chamber coupled downstream of the mixing manifold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.