Patent · US Active

Method and apparatus for real-time monitoring of plasma chamber wall condition

US10134569B1 · kind B1 · utility

13Cited by

0References

21Claims

0Family size

Assignee

Lam Research Corporation · US

Inventors

Luc Albarede · Fremont, US
Yassine Kabouzi · Fremont, US
Jorge Luque · Redwood City, US

Key dates

Filing date	Nov 28, 2017
Grant date	Nov 20, 2018
Priority date	—
Expiry date	Nov 28, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG01N21/648
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A substrate processing system includes a processing chamber. A pedestal and a showerhead are arranged in the processing chamber. A surface plasmon resonance (SPR) fiber has a central portion disposed in the processing chamber, and opposing ends disposed outside the processing chamber. A light source provides input light at one end of the SPR fiber, and a detector receives output light from the other end of the SPR fiber. Surface plasmon waves and evanescent waves constitute the output light, which is processed and analyzed to determine a condition of the processing chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.