Jorge Luque
19Patents
5h-index
25Co-inventors
66Inventor score
Filing activity: Dec 24, 2002 → Apr 15, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7239737B2 | User interface for quantifying wafer non-uniformities and graphically explore significance | Electricity | 30 | Expired |
| US10134569B1 | Method and apparatus for real-time monitoring of plasma chamber wall condition | Physics | 13 | Active |
| US8060330B2 | Method and system for centering wafer on chuck | Physics | 9 | Active |
| US7738693B2 | User interface for wafer data analysis and visualization | Electricity | 6 | Active |
| US7018855B2 | Process controls for improved wafer uniformity using integrated or standalone metrology | Emerging Cross-Sectional Technologies | 5 | Expired |
| US9735069B2 | Method and apparatus for determining process rate | Electricity | 4 | Active |
| US9640371B2 | System and method for detecting a process point in multi-mode pulse processes | Electricity | 2 | Active |
| US8492174B2 | Etch tool process indicator method and apparatus | Electricity | 1 | Active |
| US8206996B2 | Etch tool process indicator method and apparatus | Electricity | 1 | Active |
| US10242849B2 | System and method for detecting a process point in multi-mode pulse processes | Electricity | 1 | Active |
| US10504704B2 | Plasma etching systems and methods using empirical mode decomposition | Electricity | 0 | Active |
| US12360510B2 | Large spot spectral sensing to control spatial setpoints | Physics | 0 | Active |
| US10224187B1 | Detecting partial unclamping of a substrate from an ESC of a substrate processing system | Electricity | 0 | Active |
| US9548189B2 | Plasma etching systems and methods using empirical mode decomposition | Electricity | 0 | Active |
| US7945085B2 | User interface for wafer data analysis and visualization | Electricity | 0 | Active |
| US9941178B2 | Methods for detecting endpoint for through-silicon via reveal applications | Electricity | 0 | Active |
| US11056322B2 | Method and apparatus for determining process rate | Electricity | 0 | Active |
| US9543225B2 | Systems and methods for detecting endpoint for through-silicon via reveal applications | Electricity | 0 | Active |
| US11791189B2 | Reflectometer to monitor substrate movement | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.