Lithographic apparatus
US10139725B2 · kind B2 · utility
6Cited by
6References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2014 |
| Grant date | Nov 27, 2018 |
| Priority date | — |
| Expiry date | Nov 27, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.