Patent · US Active

Light emitting diode of which an active area comprises layers of inn

US10153393B2 · kind B2 · utility

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Key dates

Filing dateAug 21, 2014
Grant dateDec 11, 2018
Priority date
Expiry dateAug 21, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/818

Abstract

A light emitting diode including an n-doped InXnGa(1-Xn)N layer and a p-doped InXpGa(1-Xp)N layer, and an active area arranged between the InXnGa(1-Xn)N layer and the InXpGa(1-Xp)N layer including: a first InN layer with a thickness eInN106; a second InN layer with a thickness eInN108; a separating layer arranged between the InN layers and including InXbGa(1-Xb)N and a thickness <3 nm; an InX1Ga(1-X1)N layer arranged between the InXnGa(1-Xn)N layer and the first InN layer; an InX2Ga(1-X2)N layer arranged between the InXpGa(1-Xp)N layer and the second InN layer; wherein the indium compositions Xn, Xp, Xb, X1 and X2 are between 0 and about 0.25, and wherein the thicknesses eInN106 and eInN108 are such that eInN106<eInN108.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.