Gas distribution system, reactor including the system, and methods of using the same
US10167557B2 · kind B2 · utility
429Cited by
589References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2014 |
| Grant date | Jan 1, 2019 |
| Priority date | — |
| Expiry date | May 3, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87877
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.