Scatterometry method and system
US10302414B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 14, 2015 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Nov 10, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.