Patent · US Active

Overlay design optimization

US10311198B2 · kind B2 · utility

0Cited by

16References

13Claims

0Family size

Assignee

NOVA MEASURING INSTRUMENTS INC. · IL

Inventors

Gilad Barak · Rehovot, IL
Tal Verdene · Hulda, IL
Michal Haim YACHINI · Rehovot, IL
Dror Shafir · Kiryat Ono, IL
Changman Moon · Seoul, KR
Shay Wolfling · Kiryat Ono, IL

Key dates

Filing date	Feb 16, 2015
Grant date	Jun 4, 2019
Priority date	—
Expiry date	Jul 11, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH10D64/018
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.