Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus

US10324383B2 · kind B2 · utility

Assignees

• ASML Holding N.V. · NL
• ASML NETHERLANDS B.V. · NL

Inventors

• Raymond Wilhelmus Louis Lafarre · Helmond, NL
• Adrianus Hendrik Koevoets · Mierlo, NL
• Michael L. Nelson · Redding, US
• Jacobus Cornelius Gerardus Van Der Sanden · Geldrop, NL
• Geoffrey O'Connor · Fairfield, US
• Michael Andrew Chieda · Easton, US
• Tammo Uitterdijk · De Bilt, NL

Key dates

• Filing date: Oct 5, 2016
• Grant date: Jun 18, 2019
• Expiry date: Oct 5, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67248
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.