Monolayer film mediated precision film deposition
US10340137B2 · kind B2 · utility
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3References
12Claims
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Key dates
| Filing date | Jul 24, 2017 |
| Grant date | Jul 2, 2019 |
| Priority date | — |
| Expiry date | Jul 24, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming a thin film is described. The method includes treating at least a portion of a surface exposed on a substrate with an adsorption-promoting agent to alter a functionality of the exposed surface and cause subsequent adsorption of an organic precursor, and thereafter, adsorbing the organic precursor to the functionalized surface to form a carbon-containing film. Then, at least a portion of the surface of the carbon-containing film is exposed to an ion flux to mix the adsorbed carbon-containing film with the material of the underlying substrate and form a mixed film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.