Inventor · Austin, TX, US

Alok Ranjan

120Patents
14h-index
73Co-inventors
85Inventor score

Filing activity: Aug 25, 2011 → May 23, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US10998169B2 Systems and methods of control for plasma processing Electricity 40 Active
US9666447B2 Method for selectivity enhancement during dry plasma etching Electricity 37 Active
US8735291B2 Method for etching high-k dielectric using pulsed bias power Electricity 37 Active
US9570313B2 Method for etching high-K dielectric using pulsed bias power Electricity 37 Active
US9607843B2 Method for roughness improvement and selectivity enhancement during arc layer etch via adjustment of carbon-fluorine content Electricity 36 Active
US10063062B2 Method of detecting plasma discharge in a plasma processing system Electricity 35 Active
US10290506B2 Method for etching high-K dielectric using pulsed bias power Electricity 35 Active
US9159575B2 Method for etching high-K dielectric using pulsed bias power Electricity 35 Active
US9530667B2 Method for roughness improvement and selectivity enhancement during arc layer etch using carbon Electricity 35 Active
US9576816B2 Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogen Electricity 35 Active
US9111746B2 Method for reducing damage to low-k gate spacer during etching Electricity 27 Active
US9768033B2 Methods for high precision etching of substrates Electricity 27 Active
US9318343B2 Method to improve etch selectivity during silicon nitride spacer etch Electricity 25 Active
US8906760B2 Aspect ratio dependent deposition to improve gate spacer profile, fin-loss and hardmask-loss for FinFET scheme Electricity 17 Active
US8551877B2 Sidewall and chamfer protection during hard mask removal for interconnect patterning Electricity 9 Active
US8592327B2 Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage Electricity 8 Active
US10701103B2 Securing devices using network traffic analysis and software-defined networking (SDN) Electricity 6 Active
US9054050B2 Method for deep silicon etching using gas pulsing Electricity 6 Active
US9378975B2 Etching method to form spacers having multiple film layers Electricity 6 Active
US8809194B2 Formation of SiOCl-containing layer on spacer sidewalls to prevent CD loss during spacer etch Emerging Cross-Sectional Technologies 5 Active
US10237916B2 Systems and methods for ESC temperature control Electricity 4 Active
US10529589B2 Method of plasma etching of silicon-containing organic film using sulfur-based chemistry Electricity 4 Active
US9155183B2 Adjustable slot antenna for control of uniformity in a surface wave plasma source Electricity 3 Active
US9779952B2 Method for laterally trimming a hardmask Electricity 3 Active
US10366902B2 Methods for cyclic etching of a patterned layer Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.