Method and system for delivering hydrogen peroxide to a semiconductor processing chamber

US10343907B2 · kind B2 · utility

Assignee

• ASM IP Holding B.V. · NL

Inventors

• Bert Jongbloed · Oud-Heverlee, BE
• Dieter Pierreux · Dilbeek, BE
• Cornelius A. van der Jeugd · Heverlee, BE
• Lucian Jdira · Nieuw-Vennep, NL
• Radko G. Bankras · Almere, NL
• Theodorus G.M. Oosterlaken · Oudewater, NL

Key dates

• Filing date: Mar 17, 2015
• Grant date: Jul 9, 2019
• Expiry date: Jul 8, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67017
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

In some embodiments, a system is disclosed for delivering hydrogen peroxide to a semiconductor processing chamber. The system includes a process canister for holding a H2O2/H2O mixture in a liquid state, an evaporator provided with an evaporator heater, a first feed line for feeding the liquid H2O2/H2O mixture to the evaporator, and a second feed line for feeding the evaporated H2O2/H2O mixture to the processing chamber, the second feed line provided with a second feed line heater. The evaporator heater is configured to heat the evaporator to a temperature lower than 120° C. and the second feed line heater is configured to heat the feed line to a temperature equal to or higher than the temperature of the evaporator.