High-precision dispense system with meniscus control

US10354872B2 · kind B2 · utility

Assignee

• TOKYO ELECTRON LIMITED · JP

Inventors

• Anton J. deVilliers · Boise, US
• Rodney L. Robison · East Berne, US
• Ronald Nasman · Averill Park, US
• David Travis · Benicia, US
• James Grootegoed · Wynantskill, US
• Norman A. Jacobson, Jr. · Scotia, US
• David Hetzer · Schenectady, US
• Lior Huli · Albany, US
• Joshua Hooge · Austin, US

Key dates

• Filing date: Aug 11, 2017
• Grant date: Jul 16, 2019
• Expiry date: Aug 11, 2037

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05C5/02
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A meniscus sensor monitors a position of a meniscus of process fluid at a nozzle. The elongate bladder unit is used to maintain a position of the meniscus at a particular location by selectively expanding or contracting the bladder, thereby moving or holding a meniscus position. Expansion of the elongate bladder is also used for a suck-back action after completing a dispense action.