Inventor · Albany, NY, US

Lior Huli

21Patents
2h-index
31Co-inventors
53Inventor score

Filing activity: Apr 17, 2013 → Jun 16, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US10770294B2 Selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistance Electricity 3 Active
US9991133B2 Method for etch-based planarization of a substrate Electricity 3 Active
US8975009B2 Track processing to remove organic films in directed self-assembly chemo-epitaxy applications Physics 2 Active
US9711419B2 Substrate backside texturing Electricity 2 Active
US9281251B2 Substrate backside texturing Electricity 2 Active
US11482454B2 Methods for forming self-aligned contacts using spin-on silicon carbide Electricity 1 Active
US10141183B2 Methods of spin-on deposition of metal oxides Electricity 1 Active
US9086631B2 EUV resist sensitivity reduction Physics 1 Active
US10403501B2 High-purity dispense system Performing Operations; Transporting 1 Active
US9791779B2 EUV resist etch durability improvement and pattern collapse mitigation Electricity 1 Active
US12406887B2 Selective film formation using a self-assembled monolayer Electricity 0 Active
US11762297B2 Point-of-use blending of rinse solutions to mitigate pattern collapse Electricity 0 Active
US10685857B2 Dispense nozzle with a shielding device Electricity 0 Active
US10354872B2 High-precision dispense system with meniscus control Performing Operations; Transporting 0 Active
US11383211B2 Point-of-use dynamic concentration delivery system with high flow and high uniformity Performing Operations; Transporting 0 Active
US12080599B2 Methods for forming self-aligned contacts using spin-on silicon carbide Electricity 0 Active
US10935889B2 Extreme ultra-violet sensitivity reduction using shrink and growth method Physics 0 Active
US11243465B2 Plasma treatment method to enhance surface adhesion for lithography Electricity 0 Active
US12216400B2 Directed self-assembly Performing Operations; Transporting 0 Active
US12193231B2 Fabricating three-dimensional semiconductor structures Electricity 0 Active
US12393121B2 Point-of-use blending of rinse solutions for EUV processing to mitigate pattern collapse Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.