System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
US10362664B2 · kind B2 · utility
2Cited by
1References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 2, 2018 |
| Grant date | Jul 23, 2019 |
| Priority date | — |
| Expiry date | Feb 2, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.