Patent · US Active

Source reagent-based delivery of fluid with high material flux for batch deposition

US10385452B2 · kind B2 · utility

7Cited by
94References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 31, 2013
Grant dateAug 20, 2019
Priority date
Expiry dateJan 17, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/455
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.