High-purity dispense system

US10403501B2 · kind B2 · utility

Assignee

• TOKYO ELECTRON LIMITED · JP

Inventors

• Anton J. deVilliers · Boise, US
• Rodney L. Robison · East Berne, US
• Ronald Nasman · Averill Park, US
• David Travis · Benicia, US
• James Grootegoed · Wynantskill, US
• Norman A. Jacobson, Jr. · Scotia, US
• Lior Huli · Albany, US
• Joshua Hooge · Austin, US

Key dates

• Filing date: Aug 11, 2017
• Grant date: Sep 3, 2019
• Expiry date: Aug 11, 2037

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05C5/02
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.