Patent · US Active

Optical element and optical arrangement therewith

US10474036B2 · kind B2 · utility

1Cited by

12References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Hans-Jochen Paul · Aalen, DE
Boris Bittner · Roth, DE
Norbert Wabra · Werneck, DE
Thomas Schicketanz · Aalen, DE

Key dates

Filing date	Sep 6, 2016
Grant date	Nov 12, 2019
Priority date	—
Expiry date	Dec 22, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/062
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical arrangement includes an optical element (1) and a thermal manipulation device. The optical element has a substrate (2), a coating (3, 9, 5) applied to the substrate (2), and an antireflection coating (3). The coating (3, 9, 5) includes: a reflective multi-layer coating (5b) configured to reflect radiation (4) with a used wavelength (λEUV). The antireflection coating (3) is arranged between the substrate (2) and the reflective multi-layer coating (5b) to suppress reflection of heating radiation (7) with a heating wavelength (λH) that differs from the used wavelength (λEUV). The thermal manipulation device has at least one heating light source (8) to produce heating radiation (7).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.