Hans-Jochen Paul
13Patents
3h-index
30Co-inventors
56Inventor score
Filing activity: Dec 12, 2001 → Sep 6, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7196842B2 | Attenuating filter for ultraviolet light | Physics | 29 | Expired |
| US6697194B2 | Antireflection coating for ultraviolet light at large angles of incidence | Physics | 7 | Expired |
| US6825976B2 | Antireflection coating for ultraviolet light | Physics | 4 | Expired |
| US6863398B2 | Method and coating system for coating substrates for optical components | Chemistry; Metallurgy | 3 | Expired |
| US8294991B2 | Interference systems for microlithgraphic projection exposure systems | Physics | 2 | Active |
| US7093937B2 | Optical component and coating system for coating substrates for optical components | Chemistry; Metallurgy | 1 | Expired |
| US10474036B2 | Optical element and optical arrangement therewith | Physics | 1 | Active |
| US6836379B2 | Catadioptric objective | Physics | 1 | Expired |
| US9915873B2 | Reflective optical element, and optical system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US6967771B2 | Antireflection coating for ultraviolet light at large angles of incidence | Physics | 0 | Expired |
| US9494718B2 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Physics | 0 | Active |
| US9188771B2 | Reflective optical imaging system | Physics | 0 | Active |
| US9915876B2 | EUV mirror and optical system comprising EUV mirror | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.