Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
US10533940B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2018 |
| Grant date | Jan 14, 2020 |
| Priority date | — |
| Expiry date | Nov 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/104
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.