Ohad Bachar
27Patents
6h-index
69Co-inventors
68Inventor score
Filing activity: Aug 31, 2010 → Sep 8, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8441639B2 | Metrology systems and methods | Physics | 32 | Active |
| US9080971B2 | Metrology systems and methods | Physics | 15 | Active |
| US9581430B2 | Phase characterization of targets | Physics | 12 | Active |
| US8873054B2 | Metrology systems and methods | Physics | 12 | Active |
| US10203247B2 | Systems for providing illumination in optical metrology | Electricity | 9 | Active |
| US9958385B2 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Physics | 8 | Active |
| US8582114B2 | Overlay metrology by pupil phase analysis | Physics | 5 | Active |
| US10677588B2 | Localized telecentricity and focus optimization for overlay metrology | Physics | 4 | Active |
| US9091650B2 | Apodization for pupil imaging scatterometry | Physics | 4 | Active |
| US9164397B2 | Optics symmetrization for metrology | Physics | 4 | Active |
| US9784987B2 | Apodization for pupil imaging scatterometry | Physics | 3 | Active |
| US10371626B2 | System and method for generating multi-channel tunable illumination from a broadband source | Physics | 3 | Active |
| US10422508B2 | System and method for spectral tuning of broadband light sources | Physics | 3 | Active |
| US10444161B2 | Systems and methods for metrology with layer-specific illumination spectra | Physics | 2 | Active |
| US10831108B2 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Electricity | 2 | Active |
| US9341769B2 | Spectral control system | Physics | 2 | Active |
| US9512985B2 | Systems for providing illumination in optical metrology | Electricity | 2 | Active |
| US11353321B2 | Metrology system and method for measuring diagonal diffraction-based overlay targets | Physics | 1 | Active |
| US10533940B2 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Physics | 1 | Active |
| US11156846B2 | High-brightness illumination source for optical metrology | Physics | 1 | Active |
| US9921050B2 | Spectral control system | Physics | 0 | Active |
| US11187838B2 | Spectral filter for high-power fiber illumination sources | Physics | 0 | Active |
| US11852590B1 | Systems and methods for metrology with layer-specific illumination spectra | Physics | 0 | Active |
| US10976562B2 | Nano-structured non-polarizing beamsplitter | Physics | 0 | Active |
| US11454894B2 | Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.