Method for use in process control of manufacture of patterned sample
US10534275B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2016 |
| Grant date | Jan 14, 2020 |
| Priority date | — |
| Expiry date | Oct 9, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/011
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m<n; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m<k≤n.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.