Patent · US Active

Charged particle beam system and method of operating the same

US10541112B2 · kind B2 · utility

22Cited by

8References

34Claims

0Family size

Assignees

Carl Zeiss Microscopy GmbH · DE
Applied Materials Israel Ltd. · IL

Inventors

Stefan Schubert · Oberkochen, DE
Thomas Kemen · Meppen, DE
Rainer Knippelmeyer · Utting am Ammersee, DE

Key dates

Filing date	Oct 31, 2018
Grant date	Jan 21, 2020
Priority date	—
Expiry date	Oct 31, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/047
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A charged particle beam system comprises a particle beam source having a particle emitter at a first voltage, a first electrode downstream of the particle beam source at a second voltage, a multi-aperture plate downstream of the first electrode, a second electrode downstream of the multi-aperture plate at a third voltage, a third electrode downstream of the second electrode at a fourth voltage, a deflector downstream of the third electrode, an objective lens downstream of the deflector, a fourth electrode downstream of the deflector at a fifth voltage; and an object mount at a sixth voltage. Voltage differences between the first, second, third, fourth and fifth voltages have same and opposite signs.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.