Deposition or treatment of diamond-like carbon in a plasma reactor

US10544505B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Yang Yang · San Diego, US
• Kartik Ramaswamy · San Jose, US
• Kenneth S. Collins · San Jose, US
• Steven Lane · Porterville, US
• Gonzalo Monroy · San Francisco, US
• Lucy Chen · Santa Clara, US
• Yue Guo · Redwood City, US

Key dates

• Filing date: Sep 27, 2017
• Grant date: Jan 28, 2020
• Expiry date: Sep 27, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3321
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.