Abatement and strip process chamber in a load lock configuration
US10566205B2 · kind B2 · utility
2Cited by
81References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2013 |
| Grant date | Feb 18, 2020 |
| Priority date | — |
| Expiry date | Aug 28, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67201
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention a load lock chamber including two or more isolated chamber volumes, wherein one chamber volume is configured for processing a substrate and another chamber volume is configured to provide cooling to a substrate. One embodiment of the present invention provides a load lock chamber having at least two isolated chamber volumes formed in a chamber body assembly. The at least two isolated chamber volumes may be vertically stacked. A first chamber volume may be used to process a substrate disposed therein using reactive species. A second chamber volume may include a cooled substrate support.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.