Inventor · Santa Clara, CA, US

Jared Ahmad Lee

37Patents
7h-index
52Co-inventors
68Inventor score

Filing activity: Feb 26, 2007 → Jun 5, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US7846497B2 Method and apparatus for controlling gas flow to a processing chamber Emerging Cross-Sectional Technologies 23 Active
US7775236B2 Method and apparatus for controlling gas flow to a processing chamber Emerging Cross-Sectional Technologies 13 Active
US8074677B2 Method and apparatus for controlling gas flow to a processing chamber Emerging Cross-Sectional Technologies 11 Active
US10090181B2 Method and apparatus for substrate transfer and radical confinement Electricity 9 Active
US10204805B2 Thin heated substrate support Electricity 9 Active
US8992689B2 Method for removing halogen-containing residues from substrate Electricity 8 Active
US8845816B2 Method extending the service interval of a gas distribution plate Emerging Cross-Sectional Technologies 8 Active
US9976211B2 Plasma erosion resistant thin film coating for high temperature application Chemistry; Metallurgy 6 Active
US7975558B2 Method and apparatus for gas flow measurement Emerging Cross-Sectional Technologies 4 Active
US10815562B2 Plasma erosion resistant thin film coating for high temperature application Chemistry; Metallurgy 3 Active
US11110425B2 Gas distribution plate for thermal deposition Performing Operations; Transporting 2 Active
US11584993B2 Thermally uniform deposition station Electricity 2 Active
US10566205B2 Abatement and strip process chamber in a load lock configuration Electricity 2 Active
US11705312B2 Vertically adjustable plasma source Electricity 1 Active
US11776793B2 Plasma source with ceramic electrode plate Electricity 1 Active
US11583816B2 Gas distribution plate for thermal deposition Performing Operations; Transporting 1 Active
US10276354B2 Segmented focus ring assembly Chemistry; Metallurgy 1 Active
US9464732B2 Apparatus for uniform pumping within a substrate process chamber Emerging Cross-Sectional Technologies 1 Active
US11043386B2 Enhanced spatial ALD of metals through controlled precursor mixing Electricity 1 Active
US11887856B2 Enhanced spatial ALD of metals through controlled precursor mixing Electricity 0 Active
US11479855B2 Spatial wafer processing with improved temperature uniformity Electricity 0 Active
US11574831B2 Method and apparatus for substrate transfer and radical confinement Electricity 0 Active
US10943788B2 Abatement and strip process chamber in a load lock configuration Electricity 0 Active
US11171008B2 Abatement and strip process chamber in a dual load lock configuration Emerging Cross-Sectional Technologies 0 Active
US12288677B2 Vertically adjustable plasma source Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.