Method of performing metrology operations and system thereof

US10571406B2 · kind B2 · utility

Assignee

• Applied Materials Israel Ltd. · IL

Inventors

• Ron Katzir · Nes Ziona, IL
• Imry Kissos · Kiryat Ono, IL
• Lavi Jacov Shachar · Nes Ziona, IL
• Amit Batikoff · Netanya, IL
• Shaul Cohen · Irus, IL
• Noam Zac · Kfar Sava, IL

Key dates

• Filing date: Nov 2, 2018
• Grant date: Feb 25, 2020
• Expiry date: Nov 2, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70616
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.