Pellicle, pellicle production method and exposure method using pellicle
US10585348B2 · kind B2 · utility
1Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2017 |
| Grant date | Mar 10, 2020 |
| Priority date | — |
| Expiry date | Mar 9, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2008
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.