Hisako ISHIKAWA
7Patents
1h-index
17Co-inventors
40Inventor score
Filing activity: May 20, 2016 → Apr 2, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10585348B2 | Pellicle, pellicle production method and exposure method using pellicle | Physics | 1 | Active |
| US10488751B2 | Pellicle, production method thereof, exposure method | Electricity | 0 | Active |
| US12287569B2 | Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography | Chemistry; Metallurgy | 0 | Active |
| US10895805B2 | Pellicle manufacturing method and method for manufacturing photomask with pellicle | Physics | 0 | Active |
| US11137677B2 | Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method | Physics | 0 | Active |
| US10106660B2 | Film containing a resin having a thiourethane bond and uses thereof | Emerging Cross-Sectional Technologies | 0 | Active |
| US11852968B2 | Pellicle, exposure master, exposure device and method for manufacturing semiconductor device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.