Patent · US Active

Guided inspection of a semiconductor wafer based on systematic defects

US10605745B2 · kind B2 · utility

0Cited by

0References

17Claims

0Family size

Assignee

Applied Materials Israel Ltd. · IL

Inventors

Yotam Sofer · Givatayim, IL
Boaz Cohen · al-Araqeeb, IL
Saar Shabtay · Tira, IL
Eli Buchman · Rehovot, IL

Key dates

Filing date	Jun 28, 2018
Grant date	Mar 31, 2020
Priority date	—
Expiry date	Jun 28, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/8854
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A candidate defect may be identified at a semiconductor wafer. A determination may be made as to whether the candidate defect at the semiconductor wafer corresponds to a systematic defect or a random defect. In response to determining that the candidate defect at the semiconductor wafer corresponds to a systematic detect, the candidate defect at the semiconductor wafer may be provided to a defect review tool for review by the defect review tool.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.